Oxford Instruments specialises in the design, manufacture and support of innovative solutions, tools and systems for the emerging nanotechnology markets in areas such as XRF (X-ray Fluorescence) analysers , microanalysis systems, superconducting wires, NMR (nuclear magnetic resonance) magnets, cryogenic systems, plasma etch and deposition low temperature environments and coating thickness measurement.

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V100 molecular beam epitaxy (MBE) systems

V100 molecular beam epitaxy (MBE) systems

Molecular beam epitaxy for volume production.

Oxford Instruments’ fully automated V100 system is recognised as a key enabling technology in the realisation of today’s GaAs based microwave electronic devices such as P-HEMTs and HBTs. 

Further, the V100 is proven in many more established and emerging application areas such as:

  • Phosphorous-containing HBT’s
  • C-doped HBT’s
  • P-containing visible laser diodes (for DVD applications)
  • 980 nm pump lasers
  • 1.55 µm telecoms lasers
  • Sb-based and InAs based Hall sensors

Key benefits

The V100 system incorporates many of the most advanced designs in MBE technology:

  • The ThermaCellTM is the most stable and reproducible evaporation source available
  • The latest generation of arc-motion, soft action shutters provide the lowest defect generation and source fallback capabilities in the technology
  • The manipulator can be fitted with the latest back-surface optical monitoring of the wafer temperature
  • Optional twin source & shutter assemblies provide ultimate flexibility, allowing the number of sources to be increased to a maximum of 20

Product details

  • The V100 is designed for simultaneous growth onto 4x4”, 5x3”, 12x2” or single 6” substrates.  Wafer transport is fully automated and is integrated to the growth software.  Sample transfer has been designed to minimise the number of hand-offs for rapid load/unload times and maximum reliability
  • The deposition chamber incorporates all the necessary components for the controlled growth and doping of semiconductor materials, a complete range of effusion cells are available.  A monitoring ionisation gauge, RHEED system and residual gas analyser are used for growth and environment monitoring
  • The preparation chamber can be installed with outgassing and parking/storage facilities
  • The two fast entry chambers/locks (FELs) are low-volume and integral with the preparation chamber. Each allows a cassette of six sample holders to be loaded into the system at one time.  A cassette outgassing facility may be fitted in each entry lock
  • X-GEN3000TM process software runs under Windows XPTM with full password protection, allowing the System Manager to control the operations permitted to each user. The software enables automated flux calibration, display of chamber pressures and data logging

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